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Soitec announced the launch of a new industrial installation allowing wafer rinse water to be partially reused in the production of ultra-pure water for cleanrooms at its French manufacturing facilities.
Thanks to this innovation, the first of its kind in Europe at this scale, Soitec intends to increase significantly the proportion water that can be reused in its industrial processes. The wastewater reuse rate at its historic site in Bernin (Isère) is thereby expected to rise from 19% in 2023 to over 35% in 2024.
This solution, developed by Soitec in Bernin over three years, represents an important milestone in Soitec’s continuous improvement of resource management, one of the key pillars of its sustainable development strategy.
Cyril Menon, Soitec Chief Operations Officer: “This manufacturing process innovation is an illustration of Soitec’s commitment over several years to limit the intake of fresh water, a critical resource for semiconductor materials production. It is a significant milestone that we have reached. The introduction of this new process demonstrates that we can produce more with less, contributing to a more sustainable future.”
Soitec puts efficient management of natural resources at the heart of its commitment to sustainable development. While water is essential for the semiconductor industry, Soitec is well aware that it is a rare and precious resource that must be used responsibly and equitably by all.
From 2015 onwards, Soitec committed itself to a series of action plans to mitigate its impact on water resources. Soitec reduced its overall water consumption per unit produced by 30% between 2021 and 2023, and is targeting a further 30% reduction by 2030.
Original – Soitec
