Toshiba Tag Archive

  • Toshiba Introduced a 1200 V SBD Embedded SiC MOSFET

    Toshiba Introduced a 1200V SBD Embedded SiC MOSFET

    3 Min Read

    Toshiba Electronic Devices & Storage Corporation has developed a Schottky barrier diode (SBD) embedded metal oxide semiconductor field effect transistor (MOSFET), a significant improvement over the current device structure, while maintaining high reliability and short-circuit ruggedness.

    A successful design modification introduces a barrier structure with varying depths in the device structure that maintains the reliability of the reverse conduction operation, the function of an integrated SBD, while suppressing the current leakage from the SBD part that causes destruction during short-circuiting. By making use of new design technology and optimizing the device structure, the new MOSFET achieves lower on-resistance (RonA), with about a 26% improvement over the current structure. 

    Power semiconductors play a central role in electricity supply and control. They cut energy consumption in all kinds of electronic equipment, and are an important tool for the realization of carbon neutrality. Continued demand expansion is expected from vehicle electrification and the miniaturization of industrial equipment.

    Against this background, SiC MOSFETs are seen as next-generation power semiconductors. They deliver better power energy conversion efficiency than Si MOSFETs, and their use has expanded rapidly in recent years. However, SiC MOSFETs have a reliability problem: increased RonA due to reverse conduction operation. Toshiba has now developed an SBD-embedded SiC MOSFET that operates in reverse conduction without increasing RonA.

    Reducing the RonA of SiC MOSFET simultaneously causes excess current flow through the MOSFET part during short-circuit operation, reducing the durability of short-circuit operation. However, enhancing the conduction of the embedded SBD to improve the reliability of reverse conduction operation increases its current leakage during short-circuit operation, which also decreases the durability of short-circuit operation.

    Introducing a deep barrier structure can suppress both the excess current of the MOSFET and SBD current leakage during short-circuit operation, but it also obstructs current flow from the SBD, raising concerns about decreased reliability in diode conduction. 

    This led Toshiba to consider a barrier structure divided into shallow and deep areas. The deep barrier area successfully suppresses excess current from the MOSFET part during short-circuit operation, and reduces SBD current leakage, while leaving a shallow area effectively spreads current from the SBD without any obstruction by the barrier.

    This improves ruggedness during short-circuit operation while maintaining excellent reliability in reverse conduction operation. Toshiba has provided some customers with test samples of SiC MOSFETs with embedded SBD that apply the new technology since December 2023 for evaluation, toward further enhancing performance.

    By making use of its new design technology and optimizing the device structure, Toshiba has developed a prototype 1.2 kV class SBD-integrated MOSFET. This achieves a low RonA of 2.0 mΩcm2, about a 26% improvement over the current structure. Toshiba will present the details of this technology at The 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2024, an international conference on power semiconductors, which is being held in Bremen, Germany from June 2 to 6.

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  • Toshiba to Showcase Semiconductor, Battery, and Fine Ceramic Material Solutions at PCIM Europe 2024

    Toshiba to Showcase Semiconductor, Battery, and Fine Ceramic Material Solutions at PCIM Europe 2024

    2 Min Read

    Toshiba Electronics Europe GmbH and Toshiba Materials CO., LTD. will bring solutions that support customers’ goals in reducing their CO2 footprint at the PCIM 2024 conference and exhibition (Nuremberg 11th – 13th June).

    This year, the company will use the event to showcase a combination of several business units that support development of sustainable solutions. Semiconductor, battery, and fine ceramic material solutions form a complete chain of products in key applications from e-mobility, industrial, energy and infrastructure sectors.

    Toshiba has manufactured top-class ceramics since the 1970s, and its pioneering Silicon Nitride substrates will be on display along with bearing balls, AMOBEADS™, and Nanocrystalline common mode choke cores.

    In Toshiba’s eMobility booth area, visitors will discover demonstrations of automotive thermal management by heat pumps and fans utilising Toshiba’s newly released SmartMCD. 

    Toshiba’s industrial demonstrations highlight the entire product chain from control to isolation to power conversion stages, incorporating the latest generations of SiC, GaN and low-voltage MOSFET technologies. They include reference design implementations utilising modern topologies for factory automation, power supplies, and motor control applications.

    Energy and infrastructure demonstrations will focus on high-power solutions such as IEGT and SiC Modules supporting voltages from 1.2kV to 3.3kV. Toshiba’s SiC Cube illustrates a solution implementation for charging infrastructure utilising SiC MOSFET devices, whereas SCiB batteries demonstrate their effective use for energy storage. 

    Toshiba representatives are also scheduled to participate in the conference program speeches and poster sessions on Wide Bandgap, power semiconductors and gate driver ICs topics.

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  • Toshiba Electronic Devices & Storage Corporation Completes New 300-Millimeter Wafer Fab for Power Semiconductors

    Toshiba Electronic Devices & Storage Corporation Completes New 300-Millimeter Wafer Fab for Power Semiconductors

    2 Min Read

    Toshiba Electronic Devices & Storage Corporation held a ceremony to mark the completion of a new 300-millimeter wafer fabrication facility for power semiconductors and an office building at Kaga Toshiba Electronics Corporation in Ishikawa Prefecture, Japan, one of Toshiba’s key group companies. The completion of construction is a major milestone for Phase 1 of Toshiba’s multi-year investment program.

    Toshiba will now proceed with equipment installation, toward starting mass production in the second half of fiscal year 2024. Once Phase 1 reaches full-scale operation, Toshiba’s production capacity for power semiconductors, mainly MOSFETs and IGBTs, will be 2.5 times that of fiscal 2021, when the investment plan was made. Decisions on the construction and start of operation of Phase 2 will reflect market trends.

    The new manufacturing building follows and will make a major contribution to Toshiba’s Business Continuity Plan (BCP): it has a seismic isolation structure that absorbs earthquake shock and redundant power sources. Energy from renewable source and solar panels on the roof of the building (onsite PPA model) will allow the facility to meet 100% of its power requirement with renewable energy.
    Product quality and production efficiency will be boosted by the use of artificial intelligence (AI). Toshiba expects to receive a grant from the Ministry of Economy, Trade and Industry of Japan to subsidize its investment in part of the manufacturing equipment.

    Power semiconductors play a crucial role in electricity supply and control, and are essential devices for energy efficiency in all electrical equipment. With the continuing electrification of automobiles and the automation of industrial machinery, they are expected to see continued robust demand growth. Toshiba started power semiconductor production on a new 300-millimeter wafer line in the second half of fiscal 2022 at Kaga Toshiba Electronics’ existing facility. Going forward, the company will expand production with the new fab and further contribute to carbon neutrality. 

    Overview of Kaga Toshiba Electronics Corporation

    Location: 1-1, Iwauchi-machi, Nomi-shi, Ishikawa Prefecture, Japan
    Established: December, 1984
    President and Representative Director: Satoshi Aida
    Employees: 1,150 (as of March 31, 2024)
    Main Products: Discrete semiconductors (power semiconductors, small-signal devices and optoelectronic devices)
    Web: Kaga Toshiba Electronics Corporation

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  • Toshiba Electronic Devices & Storage Corporation Announced New Board of Directors

    Toshiba Electronic Devices & Storage Corporation Announced New Board of Directors

    1 Min Read

    Toshiba Electronic Devices & Storage Corporation announced new board of directors, with an effective date of June 1, 2024. The composition of the Board of Directors and the company’s Auditors, as of June 1, 2024, will be as follows:

    Directors and Officers of the Company:

    • Director, President & CEO – Taro SHIMADA (Toshiba Corporation)
    • Director, Vice President – Noriyasu KURIHARA
    • Director – Seiichi MORI
    • Director – Shin KUROSAWA
    • Director – Hiroyuki SHINKI (Toshiba Corporation)
    • Director – Masazumi TOMISHIGE (Toshiba Corporation)
    • Director – Takanori NAKAZAWA (Toshiba Corporation)
    • Director – Yutaka SATA (Toshiba Corporation)
    • Auditor – Hiroki OKADA
    • Auditor – Masami TAKAOKA
    • Auditor – Akira NAKANISHI (Toshiba Corporation)

    Retiring Directors as of June 1, 2023:

    • Norifumi INUKUBO
    • Hiroshi KURIKI

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  • Toshiba Released a Newly Developed 4500V1000A IEGT

    Toshiba Released a Newly Developed 4500V/1000A IEGT

    2 Min Read

    Toshiba Electronic Devices & Storage Corporation has launched a newly developed press pack IEGT “ST1000GXH35” with ratings of 4500 V/1000 A for use in high-voltage converters such as DC power transmission systems and industrial motor controllers.

    The new product ST1000GXH35 employs trench-type IEGT chips and high-speed diode chips. The IEGT chips reduce collector-emitter saturation-voltage and improve shutdown tolerance, short-circuit tolerance, and high-temperature tolerance. Therefore, collector-emitter saturation-voltage (VCE(sat) ) has been reduced by approximately 28 % from 3.00 V to 2.15 V (typical) compared with the existing product ST750GXH24.

    The high-speed diode chips suppress voltage oscillation during reverse recovery and improve reverse recovery tolerance and high-temperature tolerance. The new product can be used at a higher turn-on speed than the existing product, therefore the turn-on switching loss (Eon) has been reduced by approximately 34 % from 4.15 J to 2.75 J (typical).

    Furthermore, the test voltage for shutdown tests and short-circuit tests has been enhanced to 3400 V in response to applications requiring high voltage. In addition, the junction temperature rating has been increased from 125 °C to 150 °C (maximum) by improving the high-temperature tolerance of the diode.

    ST1000GXH35 contributes to size reduction and high output for high-voltage converters such as DC power transmissions, static VAR compensators, and industrial motor controllers.

    Applications

    • DC power transmissions
    • Static VAR compensators
    • Industrial motor controllers

    Features

    • Low collector-emitter saturation voltage and low turn-on switching loss
    • Enhanced to test-voltage 3400 V for shutdown and short-circuit tests
    • Maximum junction temperature rating: Tj(max)=150 °C

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  • Toshiba Released Two 150 V N-channel U-MOSX-H Series Power MOSFETs

    Toshiba Released Two 150 V N-channel U-MOSX-H Series Power MOSFETs

    2 Min Read

    Toshiba Electronic Devices & Storage Corporation has launched two 150 V N-channel power MOSFET products that use the new generation process “U-MOSX-H series” and are suitable for switching power supplies for industrial equipment—used for such as data centers and communication base stations—and has expanded the lineup. The new products use the surface mount type SOP Advance(N) package and their drain-source On-resistance (max) is 11.1 mΩ for “TPH1100CQ5” and 14.1 mΩ for “TPH1400CQ5.”

    The new products TPH1100CQ5 and TPH1400CQ5 have improved the reverse recovery characteristics that are critical in synchronous rectification applications. In the case of TPH1400CQ5, the reverse recovery charge is reduced by approximately 73 % and the reverse recovery time is approximately 45 % faster compared with Toshiba’s existing TPH1400CQH.

    Used in synchronous rectification applications, TPH1400CQ5 reduces the power loss of switching power supplies and helps improve efficiency. The new products reduce the drain source spike voltage generated between the drain and source when MOSFET is switched, helping to lower EMI in switching power supplies.

    Toshiba will expand its lineup of products and help to reduce power consumption for equipment.

    Applications

    • Switching power supplies (high efficiency AC-DC converters, high efficiency DC-DC converters, etc.)
    • Motor control equipment (motor drives, etc.)

    Features

    • Low reverse recovery charge:
      TPH1100CQ5 Qrr=32 nC (typ.) (-dIDR/dt=100 A/μs)
      TPH1400CQ5 Qrr=27 nC (typ.) (-dIDR/dt=100 A/μs)
    • Fast reverse recovery time: 
      TPH1100CQ5 trr=38 ns (typ.) (-dIDR/dt=100 A/μs)
      TPH1400CQ5 trr=36 ns (typ.) (-dIDR/dt=100 A/μs)
    • High channel temperature rating: Tch (max)=175 °C

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  • Toshiba Released a 4500 V1500 A Press Pack IEGT with Newly Developed Trench-Type Chips

    Toshiba Released a 4500 V/1500 A Press Pack IEGT with Newly Developed Trench-Type Chips

    2 Min Read

    Toshiba Electronic Devices & Storage Corporation has launched a press pack IEGT “ST1500GXH35A” with ratings of 4500 V/1500 A that employs newly developed trench-type IEGT chips for use in high-voltage converters such as DC power transmission systems and industrial motor controllers.

    The newly developed IEGT chips reduce collector-emitter saturation-voltage and improve shutdown tolerance, short-circuit tolerance and high-temperature tolerance.

    Therefore, compared with the existing product, the collector-emitter saturation voltage (VCE(sat)) of the new ST1500GXH35A has been reduced by approximately 26 % from 3.4 V to 2.5 V (typical). In addition, the new product features wide RBSOA by improving shutdown tolerance, and tests short-circuit tolerance at a measurement voltage of 3400 V.

    Furthermore, the junction temperature rating (Tj) has been increased from 125 °C to 150 °C (maximum) by improving the high-temperature tolerance of the diode.

    ST1500GXH35A helps to reduce the size and power consumption for high-voltage converters such as DC power transmissions, static VAR compensators, and industrial motor controllers.

    Applications

    • DC power transmissions
    • Static VAR compensators
    • Industrial motor controllers

    Features

    • Low-collector-emitter saturation: VCE(sat)=2.6 V (typ.) (VGE=15 V, IC=1500 A, Tj=150 °C)
    • Expanded RBSOA (reinforced for 3400 V of test voltage), tested short-circuit tolerance
    • Maximum junction temperature rating: Tj (max)=150 °C

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  • Toshiba Starts Volume Shipments of SmartMCD™ Series of Gate Driver ICs with Embedded Microcontroller

    Toshiba Starts Volume Shipments of SmartMCD™ Series of Gate Driver ICs with Embedded Microcontroller

    2 Min Read

    Toshiba Electronic Devices & Storage Corporation has started volume shipments of the SmartMCD™ Series of gate driver ICs with embedded microcontroller (MCU). The first product, “TB9M003FG“, is suitable for sensorless control of three-phase brushless DC motors used in automotive applications, including water and oil pumps, fans and blowers.

    TB9M003FG combines a microcontroller (Arm® Cortex®-M0), flash memory, power control functions and communications interface functions into a gate driver that controls and drives N-ch power MOSFETs for three-phase brushless DC motor drives.

    This integration will reduce system sizes and component counts while realizing advanced and complex motor control for a wide variety of automotive motor applications. The new product also incorporates Toshiba’s proprietary vector engine, hardware for sensorless sinewave control, reducing the load on the microcontroller, and the size of the software.

    A reference design using TB9M003FG, “Motor Driving Circuit for Automotive Body Electronics Using SmartMCD™”, is now available on Toshiba’s website.

    The expanding market for electric vehicles (xEV) requires electrification, component integration, downsized electronic control unit (ECUs), and quieter motors. In response, the new product contributes to downsizing of ECUs by integrating a microcontroller into the gate driver, and to quieter motors by using vector control.

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  • Toshiba Published a New Toshiba Group Policy on Diversity, Equity, Inclusion and Belonging

    Toshiba Published a New Toshiba Group Policy on Diversity, Equity, Inclusion and Belonging

    2 Min Read

    Toshiba Corporation announced a new Toshiba Group Policy on Diversity, Equity, Inclusion and Belonging (DEIB) that takes Diversity and Inclusion (D&I) initiatives promoted by the Group to a new level with the addition of Equity (E) and Belonging (B). The policy applies to all executives and employees of Toshiba Group in Japan and overseas.

    The addition of E represents fair provision of opportunities that allow all employees to take on challenges and flourish, so that all employees are able to maximize their abilities and contribute to the organization. B indicates realizing circumstances where each individual feels that, “As a member of the organization, I am in a place where I can make the most of myself,” leading to higher engagement, productivity, and employee retention.

    The policy summarizes an approach to DEIB closely attuned to the times. Toshiba Group will use it to foster a corporate culture in which all employees can turn their diversity into strengths, find fulfillment in working for the Group, and feel that they are growing by taking on various challenges while maximizing their individual capabilities.
     

    Toshiba Group Policy on Diversity, Equity, Inclusion and Belonging

    Since establishing an organization to promote D&I in 2004, under the direct control of the CEO, Toshiba Group has promoted D&I as part of the management strategy. Today, a close alignment of management goals and human resources policy is essential, and awareness of the importance of information disclosure on diversity and human capital is increasing globally. With the new policy, Toshiba Group intends to improve employee engagement and also to promote stakeholder understanding of the Group by communicating its basic stance on the participation of diverse human resources in an easy-to-understand manner.

    Guided by the basic commitment of “Committed to People, Committed to the Future,” Toshiba Group will further strengthen its efforts to promote diversity based on the DEIB policy, with the aim of achieving both employee and company growth.

    Toshiba Group DEIB Policy Website
    https://www.global.toshiba/ww/sustainability/corporate/performance/social/diversity.html

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  • Toshiba Started Mass Production of the Third Generation 1700 V SiC MOSFET Module

    Toshiba Started Mass Production of the Third Generation 1700 V SiC MOSFET Module

    2 Min Read

    Toshiba Electronic Devices & Storage Corporation has started mass production of a 3rd generation silicon carbide (SiC) 1700 V and drain current (DC) rating 250 A of SiC MOSFET module “MG250V2YMS3” for industrial equipment and has expanded its lineup.

    The new product MG250V2YMS3 offers low conduction loss with low drain-source on-voltage (sense) of 0.8 V (typ.). It also offers low switching loss with low turn-on switching loss of 18 mJ (typ.) and low turn-off switching loss of 11 mJ (typ.). This helps to reduce power loss of equipment and the size of cooling device.

    MG250V2YMS3 has a low stray inductance of 12 nH (typ.) and is capable of high-speed switching. In addition, it suppresses surge voltage in switching operation. Thus, it is available for high frequency isolated DC-DC converter.

    Toshiba’s SiC MOSFET module of 2-153A1A package has a lineup of four existing products, MG250YD2YMS3 (2200 V / 250 A), MG400V2YMS3 (1700 V / 400 A), and MG600Q2YMS3 (1200 V / 600 A), including new products. This provides a wider range of product selection.

    Toshiba will continue to meet the needs for high efficiency and the downsizing of industrial equipment.

    Applications

    Industrial equipment

    • Inverters and converters for railway vehicles
    • Auxiliary power supply for railway vehicles
    • Renewable energy power generation systems
    • Motor control equipment for industrial equipment
    • High frequency DC-DC converters, etc.

    Features

    • Low drain-source on-voltage (sense):
      VDS(on)sense=0.8 V (typ.) (ID=250 A, VGS=+20 V, Tch=25 °C)
    • Low turn-on switching loss:
      Eon=18 mJ (typ.) (VDD=900 V, ID=250 A, Tch=150 °C)
    • Low turn-off switching loss:
      Eoff=11 mJ (typ.) (VDD=900 V, ID=250 A, Tch=150 °C)
    • Low stray inductance:
      LsPN=12 nH (typ.)

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